1. Designation: R 60702. R 60704. R 60705
2. Standard: AWSA5.24 ASTM B 550/550M-07
3. Density: 6.51g/cm3
4. Size: Dia 0.5mm to 4.0mm
Zirconium Dimension |
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Grade: Zr2, Zr4, Zr60702, Zr60705 |
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Production |
Standard |
Size |
Zirconium bar |
GB8769-88 ASTMB550 |
dia(6-120mm)*(50-2500mm) |
Zirconium wire |
ASTMB550 |
dia(0.5-6mm)*L |
Zirconium plate |
ASTMB551 |
(thkness1.0-35mm)*(W50-500mm)*(L10-2000mm) |
Zirconium tube |
ASTMB523 |
OD(3.0-100mm)*(L50-3000mm) |
Zirconium foil |
ASTMB628 |
thkness0.05-6mm*W20-150mm*L |
5. Chemical composition
Grade |
main chemical composition |
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Zr |
Sn |
Fe |
Ni |
Cr |
Fe+Ni+Cr |
Fe+Cr |
|
Zr01 |
base |
--- |
--- |
--- |
--- |
--- |
--- |
ZrSn1.4-0.1 |
base |
1.20-1.70 |
0.07-0.20 |
0.03-0.08 |
0.05-0.15 |
0.18-0.38 |
--- |
ZrSn1.4-0.2 |
base |
1.20-1.70 |
0.18-0.24 |
--- |
0.07-0.13 |
--- |
0.28-0.37 |
Grade |
Zr+Hf |
Hf |
Fe+Cr |
H |
N |
C |
O |
Nb |
R60702 |
99.2% |
4.5% |
0.20% |
0.004% |
0.020% |
0.050% |
0.16% |
--- |
R60705 |
95.5% |
4.5% |
0.2% |
0.005% |
0.025% |
0.050% |
0.08% |
2.0-3.0% |
6. Applications:
For use in semiconductor, Chemical Vapor Deposition (CVD) and Physical Vapor Deposition (PVD) processes including Thermal and Electron Beam (E-Beam) Evaporation, Low Temperature Organic Evaporation, Atomic Layer Deposition (ALD), Metallic-Organic and Chemical Vapor Deposition (MOCVD).
For plasma cutting use: inserts into the electrode.
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